| Title | X-ray diffraction for characterizing metallic films |
| Publication Type | Book Chapter |
| Year of Publication | 2013 |
| Authors | Ingham, B., and Toney M.F. |
| Book Title | Metallic Films for Electronic, Optical and Magnetic Applications: Structure, Processing and Properties |
| Pagination | 3 - 38 |
| ISBN | 9780857090577 (ISBN) |
| Abstract | X-ray diffraction (XRD) is a useful tool in obtaining information about the atomic structure of materials. In this chapter we describe how information can be extracted from XRD patterns of thin films. We begin with a discussion on reciprocal space, and then describe analysis methods for determining phase quantification, chemical order, defects and microstructure, and preferential orientation. Finally a short discussion is given concerning the experimental considerations in collecting XRD patterns from thin films. © 2014 Woodhead Publishing Limited. All rights reserved. |
| URL | http://www.scopus.com/inward/record.url?eid=2-s2.0-84904029793&partnerID=40&md5=deb8d88cadf802906fc5db0ca69bb119 |
| DOI | 10.1533/9780857096296.1.3 |
