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TitleStress evolution in SN thin films during thermal cycling
Publication TypeConference Paper
Year of Publication2009
AuthorsStevens, K.J., Cheong K.C., Cai Z., Ingham B., and Toney M.F.
Conference NameAIP Conference Proceedings
Date Published2009
AbstractFinite Element Modelling and corresponding X-ray and Electron Back-Scatter Diffraction measurements have been used to investigate the development of strain in thin tin films during thermal cycling. The modeled average strain in the film was found to agree within 20% to the experimental result, although the strain within individual grains was found to vary dramatically as observed by electron backscatter diffraction and synchrotron microdiffraction. © 2009 American Institute of Physics.
URLhttp://www.scopus.com/inward/record.url?eid=2-s2.0-70449793139&partnerID=40&md5=5ab4f8fcc923eb867a53f819cb570b26
DOI10.1063/1.3203222

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