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TitleDissolution characteristics of Al2Cu and AI-4%Cu thin films
Publication TypeConference Paper
Year of Publication2007
AuthorsMissert, N., Isaacs H.S., Copeland R.G., Ingham B., Huang R., and Vasiljevic N.
Conference NameECS Transactions
Date Published2007
KeywordsAbsorption, Absorption spectroscopy, Al-Cu alloys, aluminum, Aluminum corrosion, Blood vessel prostheses, Copper alloys, Corrosion, Critical factors, Dissolution, Dissolution characteristics, In situ X ray absorption spectroscopy, Localized corrosion, oxidation states, redistribution processes, X ray spectroscopy
AbstractAlthough Cu redistribution during dissolution of Al-Cu alloys is thought to have an important influence on susceptibility to localized corrosion, the details of the redistribution process in different environments are still not clear. This work uses in-situ x-ray absorption spectroscopy to follow the oxidation state of Cu in interraetallic Al2Cu and Al-4%Cu thin films during dissolution under potential control, in pH 10 borate and near-neutral Cl- environments. The oxidation state of Cu is observed to change only following significant dissolution of Al at potentials well above open circuit. In borate, formation of Cu (I) and Cu (II) occurs at potentials below the equilibrium potential for Cu/Cu2O, suggesting that the surface Cu is electrically isolated from the matrix. At higher potentials and longer exposure times, Cu ions went into solution, but subsequent re-plating of Cu on the surface was not observed. copyright The Electrochemical Society.

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