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Callaghan Innovation Research Papers

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TitleCharacterization of conductive Al-doped ZnO thin films for plasmonic applications
Publication TypeJournal Article
Year of Publication2018
AuthorsMasouleh, F.F., Sinno I., Buckley R.G., Gouws G., and Moore C.P.
JournalApplied Physics A: Materials Science and Processing
Volume124
Issue2
Date Published2018
ISSN09478396 (ISSN)
KeywordsAl doped ZnO thin films, Al-doped zinc oxide films, aluminum, Aluminum compounds, Carrier concentration, Conductive films, Data handling, Electron gas, Electrons, Fourier transform infrared spectroscopy, Hall effect, Hall effect measurement, Information analysis, Magnetron sputtering, Oxide films, Plasma waves, Plasmonic properties, Plasmons, rf-Magnetron sputtering, Rutherford backscattering spectroscopy, Spectral data analysis, Spectroscopy measurements, Spectrum Analysis, Subsequent data analysis, Thin films, Zinc, Zinc compounds, Zinc oxide
URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-85040969648&doi=10.1007%2fs00339-018-1600-y&partnerID=40&md5=811fbed431387a8d2ec20df9916e07ce
DOI10.1007/s00339-018-1600-y
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