Title | Characterization of conductive Al-doped ZnO thin films for plasmonic applications |
Publication Type | Journal Article |
Year of Publication | 2018 |
Authors | Masouleh, F.F., Sinno I., Buckley R.G., Gouws G., and Moore C.P. |
Journal | Applied Physics A: Materials Science and Processing |
Volume | 124 |
Issue | 2 |
Date Published | 2018 |
ISSN | 09478396 (ISSN) |
Keywords | Al doped ZnO thin films, Al-doped zinc oxide films, aluminum, Aluminum compounds, Carrier concentration, Conductive films, Data handling, Electron gas, Electrons, Fourier transform infrared spectroscopy, Hall effect, Hall effect measurement, Information analysis, Magnetron sputtering, Oxide films, Plasma waves, Plasmonic properties, Plasmons, rf-Magnetron sputtering, Rutherford backscattering spectroscopy, Spectral data analysis, Spectroscopy measurements, Spectrum Analysis, Subsequent data analysis, Thin films, Zinc, Zinc compounds, Zinc oxide |
URL | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85040969648&doi=10.1007%2fs00339-018-1600-y&partnerID=40&md5=811fbed431387a8d2ec20df9916e07ce |
DOI | 10.1007/s00339-018-1600-y |